Our 532 nm nanosecond green laser features high repetition rates and high pulse energy, delivering reliable performance for precision applications. Its stable output and excellent beam quality make it ideal for scientific research, industrial processing, and other high-demand environments.

Our 1064 nm high-energy laser delivers joule-level pulse energy with a narrow pulse width, ensuring precise and efficient performance for a wide range of industrial, scientific, and medical applications. Designed for reliability and stability, this laser is ideal for tasks requiring high peak power and excellent beam quality.

This high-energy nanosecond laser delivers up to hundreds of millijoules per pulse at a repetition rate of 100 Hz. Operating at 1064 nm, it provides exceptional beam quality, outstanding pulse-to-pulse stability, and reliable long-term performance. The laser is ideal for applications such as laser-induced breakdown spectroscopy (LIBS), nonlinear optics experiments, and precision material processing. With its robust design and stable operation, it ensures consistent performance even in demanding laboratory and industrial environments.

This nanosecond laser system delivers high pulse energy and stable output at 1064 nm, 532 nm, and 355 nm wavelengths. Designed for industrial and scientific applications, it features a high repetition rate, excellent beam quality, and superior power stability. The laser provides precise and efficient performance for micromachining, LIDAR, LIBS, and other demanding processes. With its compact design and reliable operation, it offers an ideal solution for users requiring high power and multi-wavelength versatility.

The 1030/515 nm high power femtosecond laser offers ultra-short pulse duration and exceptional beam quality, enabling high-precision, low-thermal-effect material processing. Its dual-wavelength output provides flexibility for a wide range of industrial and scientific applications, including microfabrication, transparent material processing, biomedical imaging, and nonlinear optics research. With high stability, high repetition rate, and customizable pulse energy, this laser is an ideal choice for users who require accuracy, efficiency, and superior performance in ultrafast laser processing.

The 2940 nm Er:YAG laser is a solid-state laser that emits in the mid-infrared region, precisely matching the strong absorption peak of water molecules. This makes it highly effective for medical, dental, and dermatological applications such as skin resurfacing, scar removal, and tissue ablation. In industrial and scientific fields, it is also used for materials processing, spectroscopy, and research involving infrared interactions. Featuring high pulse energy, excellent beam quality, and precise control, the Er:YAG laser provides efficient, clean, and minimally invasive operation across a wide range of applications.

Continuous ultraviolet lasers are used in semiconductor material defect detection, Raman spectroscopy research, ultraviolet lithography, photoluminescence and fluorescence excitation.

This versatile nanosecond laser offers wavelength tunability at 1064 nm, 532 nm, and 355 nm, providing flexibility for various industrial and scientific applications. Its adjustable pulse width and repetition rate allow users to optimize processing precision and efficiency. With stable output, excellent beam quality, and robust design, it is well-suited for material processing, laser marking, micromachining, spectroscopy, and research experiments requiring multi-wavelength operation.

This compact microchip laser delivers dual-wavelength output at 1064 nm and 532 nm with a pulse duration of approximately 300 ps. Featuring a passively Q-switched design, it offers high peak power, excellent beam quality (TEM₀₀), and superior pulse-to-pulse stability. The laser is conduction-cooled and highly reliable, making it ideal for precision micromachining, LiDAR, laser ranging, biomedical analysis, and scientific research applications.

The 532 nm high repetition rate sequential green laser delivers precise, high-speed laser pulses for advanced material processing and microfabrication. With excellent beam quality, stable output, and high pulse repetition frequency, it is ideal for applications such as glass and sapphire cutting, PCB drilling, microelectronics, and precision marking. Its sequential pulse operation ensures uniform energy distribution, minimizing thermal effects and achieving high processing efficiency. Compact and reliable, this laser provides a versatile solution for industrial and research applications requiring precision, speed, and consistency.

The 1064/532/355 nm high-power picosecond laser is designed for advanced precision laser processing applications. It delivers high pulse energy, excellent beam quality, and multiple wavelength options, making it ideal for machining hard and brittle materials such as sapphire, ceramics, semiconductors, OLED, and glass. It is also widely used in polymer processing, metal sheet etching, 3C manufacturing, photovoltaic industries, and high-precision drilling, including fuel nozzle and micro-hole fabrication. Its stable performance and compact design ensure reliable operation in both industrial and research environments.

The dissipative soliton OPO has advantages in many areas of application: nonlinear optics research, precision material processing, free space optics communication, environmental monitoring and biomedical, etc