1064/532/355nm High Repetition Rate High Power Nanosecond Laser

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  • 1064/532/355nm High Repetition Rate High Power Nanosecond Laser

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This nanosecond laser system delivers high pulse energy and stable output at 1064 nm, 532 nm, and 355 nm wavelengths. Designed for industrial and scientific applications, it features a high repetition rate, excellent beam quality, and superior power stability. The laser provides precise and efficient performance for micromachining, LIDAR, LIBS, and other demanding processes. With its compact design and reliable operation, it offers an ideal solution for users requiring high power and multi-wavelength versatility.

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Product Description:

1064/532/355nm High Repetition  Rate High Power Nanosecond Laser


Product Feature

1. Excellent beam quality: M² <1.5@1064nm; M² <1.3@532/355nm

2. 150W Near-Infrared  & 40W Ultraviolet  Fundamental Mode  Output

3. Long-term power  stability is  high RMS <1%

4. Supports pulse  width  customization less than 5ns


Typical Application

1. Micro-machining 

2. Material processing 

3. SiC epitaxial processing 

4. Marking and cutting of  ultra-hard materials 

5. Laser ranging


Product Introduction

Product ModelsPU355-40SNPV532-90SNPN1064-150SN
Wavelength355±1nm532±1nm1064±1nm
Average Power≥40W≥90W≥150W
Repetition Frequency10-50kHz（Customizable）
Pulse Width10~20ns（Customizable）
Ellipticity≥90%
Beam QualityM² ≤1.4M² ≤1.4M² ≤1.5
Power StabilityRMS≤2%RMS≤2%RMS≤1%
CoolingWater-cooled


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Average Power at 1064 nm:  >150 W


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Beam Quality at 1064 nm  (Near-Infrared)


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Beam Quality at 532 nm  (Green Light)

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